The invention includes polishing processes, methods of polishing materials, methods for slowing a rate of material removal of a polishing process, and methods of forming trench isolation regions. In one aspect, the invention includes a method comprising: a) forming a material over a surface of a substrate;...http://www.google.es/patents/US6386951?utm_source=gb-gplus-sharePatente US6386951 - Methods of polishing materials, methods of slowing a rate of material removal of a polishing process, and methods of forming trench isolation regions
Methods of polishing materials, methods of slowing a rate of material ...
