A method is provided of fabricating a thin film transistor semiconductor film of polycrystalline silicon on a transparent substrate suitable for the manufacture of a liquid crystal display. The deposition of silicon film at very low rates provides conditions for the optimum formation of microcrystallites....http://www.google.es/patents/US6329270?utm_source=gb-gplus-sharePatente US6329270 - Laser annealed microcrystalline film and method for same
Laser annealed microcrystalline film and method for same
