An improved apparatus and method for substrate layer deposition in which substrate layers are grown by carrier gas delivery of sequential pulses of reactants to the substrate surface. At least one of the reactants comprises excited species, e.g., radicals. In a specific embodiment, the apparatus of this...http://www.google.es/patents/US20030101927?utm_source=gb-gplus-sharePatente US20030101927 - Apparatus and method for growth of a thin film
Número de solicitud: 10/317,266 Número de publicación: US 2003/0101927 A1 Fecha de presentación: 10 Dic 2002 Patente emitida: US7141499 ( Fecha de emisión 28 Nov 2006)
