A gas distribution system for uniformly or non-uniformly distributing gas across the surface of a semiconductor substrate. The gas distribution system includes a support plate and a showerhead which are secured together to define a gas distribution chamber therebetween. A baffle assembly including one...http://www.google.es/patents/US6432831?utm_source=gb-gplus-sharePatente US6432831 - Gas distribution apparatus for semiconductor processing
Gas distribution apparatus for semiconductor processing
