A method and system to reduce the resistance of refractory metal layers by controlling the presence of fluorine contained therein. The present invention is based upon the discovery that when employing ALD techniques to form refractory metal layers on a substrate, the carrier gas employed impacts the...http://www.google.es/patents/US20060128132?utm_source=gb-gplus-sharePatente US20060128132 - Method and system for controlling the presence of fluorine in refractory metal layers
Method and system for controlling the presence of fluorine in refractory ...
Número de solicitud: 11/338,565 Número de publicación: US 2006/0128132 A1 Fecha de presentación: 24 Ene 2006 Patente emitida: US7115494 ( Fecha de emisión 3 Oct 2006)
