A photolithography mask for optically transferring a pattern formed in the mask onto a substrate and for negating optical proximity effects. The mask includes a plurality of resolvable features to be printed on the substrate, and at least one non-resolvable optical proximity correction feature, where...http://www.google.es/patents/US7026081?utm_source=gb-gplus-sharePatente US7026081 - Optical proximity correction method utilizing phase-edges as sub-resolution assist features
Optical proximity correction method utilizing phase-edges as sub-resolution ...
