A system and method for predicting software models used in chemical mechanical polishing (CMP) of workpieces using material-centric process instrumentation. One embodiment is a system which includes a feed forward loop for computing predictive calculations, a feed back loop for computing run-to-run calculations,...http://www.google.es/patents/US20010039462?utm_source=gb-gplus-sharePatente US20010039462 - System and method for predicting software models using material-centric process instrumentation
System and method for predicting software models using material-centric ...
