In a method and an apparatus for cleaning a substrate using a laser beam, an inner chamber is disposed in a process chamber to define a space in which a laser-induced shock wave is generated. The laser beam is focused on a laser focus positioned in the inner chamber, and thus the laser-induced plasma...http://www.google.es/patents/US8163129?utm_source=gb-gplus-sharePatente US8163129 - Method and apparatus for cleaning a substrate
