The end of a cleaning process of a vacuum workpiece processing chamber evacuated to a constant pressure vacuum condition is controlled. The chamber is cleaned by exciting a cleaning gas to a plasma state by a field including an electric component. The process is terminated in response to detection of...http://www.google.es/patents/US6017414?utm_source=gb-gplus-sharePatente US6017414 - Method of and apparatus for detecting and controlling in situ cleaning time of vacuum processing chambers
Method of and apparatus for detecting and controlling in situ cleaning time ...
