A process for the preparation of substrates used in the manufacture of integrated circuits wherein spin-on low dielectric constant (low-k) polymer films are applied on semiconductor substrates. A non-etchback processing of spin-on low-k polymer films, without losing the low dielectric constant feature...http://www.google.es/patents/US6080526?utm_source=gb-gplus-sharePatente US6080526 - Integration of low-k polymers into interlevel dielectrics using controlled electron-beam radiation
Integration of low-k polymers into interlevel dielectrics using controlled ...
