A reticle base level block to support a reticle stage for holding a reticle, a wafer base level block to support a wafer stage for holding a wafer, and the like are supported to be independent of other portions and be controllable in their attitudes by parallel link mechanisms each including at least...http://www.google.es/patents/US6940582?utm_source=gb-gplus-sharePatente US6940582 - Parallel link mechanism, exposure system and method of manufacturing the same, and method of manufacturing devices
Parallel link mechanism, exposure system and method of manufacturing the ...
