A pattern is formed by applying an undercoat layer comprising a naphthol-dicyclopentadiene copolycondensate on a processable substrate as an antireflective film, applying a photoresist layer over the undercoat layer, exposing the photoresist layer to radiation, developing the resist with a developer...http://www.google.es/patents/US7427464?utm_source=gb-gplus-sharePatente US7427464 - Patterning process and undercoat-forming material
