A method of forming a conformal aluminum film on a refractory metal nitride layer is provided and includes positioning a substrate having the refractory metal nitride layer thereon within a chemical vapor deposition chamber; establishing a nominal temperature for the substrate; introducing a carrier...http://www.google.es/patents/US6204175?utm_source=gb-gplus-sharePatente US6204175 - Method of depositing a smooth conformal aluminum film on a refractory metal nitride layer
Method of depositing a smooth conformal aluminum film on a refractory metal ...
