A method for forming imprint lithography templates is described herein. The method includes forming a masking layer and a conductive layer on a substrate surface. The use of a conductive layer allows patterning of the masking layer using electron beam pattern generators. The substrate is etched using...http://www.google.es/patents/US20030205657?utm_source=gb-gplus-sharePatente US20030205657 - Methods of manufacturing a lithography template
