An exposure apparatus includes a chamber surrounding a predetermined space, a first gas supply unit for supplying a first gas into the chamber, a second gas supply unit for supplying a second gas, different from the first gas into the chamber, and a switching mechanism for supplying one of the first...http://www.google.es/patents/US20010028443?utm_source=gb-gplus-sharePatente US20010028443 - Exposure apparatus, gas replacing method, and method of manufacturing a semiconductor device
Exposure apparatus, gas replacing method, and method of manufacturing a ...
Número de solicitud: 09/811,447 Número de publicación: US 2001/0028443 A1 Fecha de presentación: 20 Mar 2001 Patente emitida: US6873397 ( Fecha de emisión 29 Mar 2005)
