An apparatus for cyclical depositing of thin films on semiconductor substrates, comprising a process chamber having a gas distribution system with separate paths for process gases and an exhaust system synchronized with operation of valves dosing the process gases into a reaction region of the chamber....http://www.google.es/patents/US20030172872?utm_source=gb-gplus-sharePatente US20030172872 - Apparatus for cyclical deposition of thin films
Número de solicitud: 10/352,257 Número de publicación: US 2003/0172872 A1 Fecha de presentación: 27 Ene 2003 Patente emitida: US7175713 ( Fecha de emisión 13 Feb 2007)
