A projection exposure apparatus and method forms a first intensity distribution on a predetermined plane substantially conjugate with a pupil plane of a projection optical system. A shaping optical system is located between a light source and an optical integrator of an illumination optical system. The...http://www.google.es/patents/US6704092?utm_source=gb-gplus-sharePatente US6704092 - Projection exposure method and apparatus that produces an intensity distribution on a plane substantially conjugate to a projection optical system pupil plane
Projection exposure method and apparatus that produces an intensity ...
