Provided is a method of manufacturing a semiconductor device capable of effectively removing impurity product attached to a semiconductor film while suppressing coming off of, for example, hemispherical grains formed on a semiconductor film containing an impurity. Spherical or hemispherical grains are...http://www.google.es/patents/US6815289?utm_source=gb-gplus-sharePatente US6815289 - Method of manufacturing semiconductor device
