Photopolymerizable elements are described comprising a sheet support, a photopolymerizable layer having a thickness of, at most, 0.0006 inch (0.015 mm.) and an optical density of at least 3.0 in the actinic region. Resist images made from these elements may be etched by a process of chemically undercutting...http://www.google.es/patents/US4229520?utm_source=gb-gplus-sharePatente US4229520 - Photo-polymerization and development process which produces dot-etchable material
Photo-polymerization and development process which produces dot-etchable ...
