A method for depositing a tungsten nitride layer is provided. The method includes a cyclical process of alternately adsorbing a tungsten-containing compound and a nitrogen-containing compound on a substrate. The barrier layer has a reduced resistivity, lower concentration of fluorine, and can be deposited...http://www.google.es/patents/US7115499?utm_source=gb-gplus-sharePatente US7115499 - Cyclical deposition of tungsten nitride for metal oxide gate electrode
Cyclical deposition of tungsten nitride for metal oxide gate electrode
