Anti-reflective coating materials for ultraviolet photolithography include at least one organic light-absorbing compound incorporated into spin-on-glass materials. Suitable absorbing compounds are strongly absorbing over wavelength ranges around wavelengths such as 365 nm, 248 nm, 193 nm and 157 nm that...http://www.google.es/patents/US6824879?utm_source=gb-gplus-sharePatente US6824879 - Spin-on-glass anti-reflective coatings for photolithography
Spin-on-glass anti-reflective coatings for photolithography
