An electron-beam deposition system includes an evaporation source having a source target with a target location at which a deposition material may be positioned, and a controllable electron-beam source disposed to direct an electron beam at the target location. A trailing-indicator monitor measures a...http://www.google.es/patents/US7130062?utm_source=gb-gplus-sharePatente US7130062 - Rapid-response electron-beam deposition system having a controller utilizing leading and trailing deposition indicators
Rapid-response electron-beam deposition system having a controller utilizing ...
