An apparatus and method for atomic layer deposition with improved efficiency of both chemical dose and purge is presented. The apparatus includes an integrated equipment and procedure for chamber maintenance. ...http://www.google.es/patents/US20030180458?utm_source=gb-gplus-sharePatente US20030180458 - ALD apparatus and method
Número de solicitud: 10/347,575 Número de publicación: US 2003/0180458 A1 Fecha de presentación: 17 Ene 2003 Patente emitida: US6911092 ( Fecha de emisión 28 Jun 2005)
