Disclosed are immersion lithography methods involving irradiating a first photoresist through a lens and an immersion liquid, the immersion liquid contacting the lens and the first photoresist in a first apparatus; contacting the lens with a supercritical fluid in a second apparatus; and irradiating...http://www.google.es/patents/US7381278?utm_source=gb-gplus-sharePatente US7381278 - Using supercritical fluids to clean lenses and monitor defects
Using supercritical fluids to clean lenses and monitor defects
