Described are systems for patterning a substrate by imprint lithography. Imprint lithography systems include an imprint head configured to hold a template in a spaced relation to a substrate. The imprint lithography system is configured to dispense an activating light curable liquid onto a substrate...http://www.google.es/patents/US20040008334?utm_source=gb-gplus-sharePatente US20040008334 - Step and repeat imprint lithography systems
Número de solicitud: 10/194,414 Número de publicación: US 2004/0008334 A1 Fecha de presentación: 11 Jul 2002 Patente emitida: US6900881 ( Fecha de emisión 31 May 2005)
