The substrate electrode plasma generating apparatus is constituted of an array of small gap thin film electrode pairs 1, 2, 3, and 4 formed by sputtering and dry etching tungsten on a silicon substrate 5 with an oxidized surface....http://www.google.es/patents/US6538387?utm_source=gb-gplus-sharePatente US6538387 - Substrate electrode plasma generator and substance/material processing method
Substrate electrode plasma generator and substance/material processing method
