A process solution applying apparatus comprising a substrate holding mechanism for holding a substrate, a process solution supplying system for applying process solution in a prescribed amount to the substrate held by the substrate holding mechanism, the process solution supplying system having a supplying...http://www.google.es/patents/US20010037763?utm_source=gb-gplus-sharePatente US20010037763 - Apparatus and method for applying process solution
Apparatus and method for applying process solution
Número de solicitud: 09/905,504 Número de publicación: US 2001/0037763 A1 Fecha de presentación: 12 Jul 2001 Patente emitida: US6821550 ( Fecha de emisión 23 Nov 2004)
