The plasma dry cleaning rate of semiconductor process chamber walls can be improved by placing a non-gaseous dry cleaning enhancement material in the position which was occupied by the workpiece during semiconductor processing. The non-gaseous dry cleaning enhancement material is either capable...http://www.google.es/patents/US5676759?utm_source=gb-gplus-sharePatente US5676759 - Plasma dry cleaning of semiconductor processing chambers
Plasma dry cleaning of semiconductor processing chambers
