In a semiconductor device manufacturing apparatus that processing a substrate by applying a voltage to a gas to create a plasma, positively charged particles are trapped or guided at the instant that the cathode voltage is stopped, by an electrode to which is imparted a negative voltage, so as to prevent...http://www.google.es/patents/US6184489?utm_source=gb-gplus-sharePatente US6184489 - Particle-removing apparatus for a semiconductor device manufacturing apparatus and method of removing particles
Particle-removing apparatus for a semiconductor device manufacturing ...
