A HMDS gas is supplied to a surface of a wafer W to perform a hydrophobic process, thereafter the wafer W is contained in an airtight container on a cassette stage, and is transferred to an analyzer provided at an external portion of a resist pattern forming apparatus. The analyzer performs mass spectrometry...http://www.google.es/patents/US6617095?utm_source=gb-gplus-sharePatente US6617095 - Evaluating method of hydrophobic process, forming method of resist pattern, and forming system of resist pattern
Evaluating method of hydrophobic process, forming method of resist pattern ...
