A system and method for processing substrates that achieves isothermal and uniform fluid flow processing conditions for a plurality of substrates. In one aspect, the invention is a system and method that utilizes matching the emissivity value of the surfaces of a process chamber that oppose exposed surfaces...http://www.google.es/patents/US7771563?utm_source=gb-gplus-sharePatente US7771563 - Systems and methods for achieving isothermal batch processing of substrates used for the production of micro-electro-mechanical-systems
Systems and methods for achieving isothermal batch processing of substrates ...
