A gas injection apparatus for injecting a reactive gas into a reaction chamber of a semiconductor processing system includes an injector in contact with an inner surface of a wall of the reaction chamber. The injector has a plurality of nozzles through which the reactive gas is injected into the reaction...http://www.google.es/patents/US7252716?utm_source=gb-gplus-sharePatente US7252716 - Gas injection apparatus for semiconductor processing system
Gas injection apparatus for semiconductor processing system
