A system and method use a lithographic apparatus to direct a plurality of patterned beams onto a substrate supported on a substrate table. The patterned beams are projected onto target portions of the substrate and relative displacement between the substrate and the patterned beams causes the beams to...http://www.google.es/patents/US7538855?utm_source=gb-gplus-sharePatente US7538855 - Lithographic apparatus and device manufacturing method
Lithographic apparatus and device manufacturing method
