A complex building agent, such as EDTA is added in a predetermined concentration to the "SC 1" step of a "PIRANHA-RCA" cleaning sequence for reducing the metal contamination left on the surface of a silicon wafer after completion of this cleaning step....http://www.google.es/patents/US5637151?utm_source=gb-gplus-sharePatente US5637151 - Method for reducing metal contamination of silicon wafers during semiconductor manufacturing
Method for reducing metal contamination of silicon wafers during ...
