A method for forming a conductive or magnetic pattern for a semiconductor or other electronic device includes patterning a mask layer outwardly from a conductive layer of the semiconductor device. The patterning defines portions of the conductive layer where vias through the conductive layer are desired....http://www.google.es/patents/US7037832?utm_source=gb-gplus-sharePatente US7037832 - Method of forming a conductive pattern by removing a compound with heat in a substantially inert atmosphere
Method of forming a conductive pattern by removing a compound with heat in a ...