A method of depositing includes: loading a substrate into a reactor; and conducting a plurality of atomic layer deposition cycles on the substrate in the reactor. At least one of the cycles includes steps of: supplying a ruthenium precursor to the reactor; supplying a purge gas to the reactor; and supplying...http://www.google.es/patents/US20090163024?utm_source=gb-gplus-sharePatente US20090163024 - METHODS OF DEPOSITING A RUTHENIUM FILM
