In an immersion lithographic apparatus, a final element is disclosed having, on a surface nearest the substrate, a layer bonded to the surface and having an edge barrier, of the same material as the layer, extending from the layer away from the substrate to shield the final element from a liquid. In...http://www.google.es/patents/US8013978?utm_source=gb-gplus-sharePatente US8013978 - Lithographic apparatus and device manufacturing method
Lithographic apparatus and device manufacturing method
