A method of fabricating a capacitor of a semiconductor memory device includes the steps of: forming an interlevel insulating layer on a semiconductor substrate on which the capacitor will be formed, selectively etching a portion of the interlevel insulating layer placed on a capacitor forming...http://www.google.es/patents/US5780334?utm_source=gb-gplus-sharePatente US5780334 - Method of fabricating capacitor of semiconductor memory device
Method of fabricating capacitor of semiconductor memory device
