Ruthenium, osmium and their oxides can be etched simply and rapidly by supplying an atomic oxygen-donating gas, typically ozone, to the aforementioned metals and their oxides through catalysis between the metals and their oxides, and the ozone without any damages to wafers and reactors and application...http://www.google.es/patents/US6537461?utm_source=gb-gplus-sharePatente US6537461 - Process for treating solid surface and substrate surface
Process for treating solid surface and substrate surface
