Workpieces requiring low levels of contamination, such as semiconductor wafers, are loaded into a rotor within a process chamber. The process chamber has a horizontal drain opening in its cylindrical wall. The chamber is closed via a door. A process or rinsing liquid is introduced into the chamber. The...http://www.google.es/patents/US6668844?utm_source=gb-gplus-sharePatente US6668844 - Systems and methods for processing workpieces
