An elevated containment structure in the shape of a wafer edge ring surrounding a surface of a semiconductor wafer is disclosed, as well as methods of forming and using such a structure. In one embodiment, a wafer edge ring is formed using a stereolithography (STL) process. In another embodiment, a wafer...http://www.google.es/patents/US7615119?utm_source=gb-gplus-sharePatente US7615119 - Apparatus for spin coating semiconductor substrates
Apparatus for spin coating semiconductor substrates
