A load cup for transferring a substrate in a chemical mechanical polishing system is provided. In one embodiment, a load cup for transferring substrates in a chemical mechanical polishing system includes a substrate support having a first side adapted to support a substrate thereon and at least one actuator...http://www.google.es/patents/US7101253?utm_source=gb-gplus-sharePatente US7101253 - Load cup for chemical mechanical polishing
