A plasma processing apparatus mainly comprises a processing chamber (10) formed by a vacuum vessel, a magnetic field forming coil (80) arranged around the processing chamber for forming a rotating magnetic field and gas supply means (101) supplying various gases to the processing chamber (10). The processing...http://www.google.es/patents/US6287980?utm_source=gb-gplus-sharePatente US6287980 - Plasma processing method and plasma processing apparatus
Plasma processing method and plasma processing apparatus
