A method for manufacturing a capacitor of a semiconductor memory device by a two-step thermal treatment is provided. A lower electrode is formed on a semiconductor substrate. A dielectric layer is formed over the lower electrode. An upper electrode formed of a noble metal is formed over the dielectric...http://www.google.es/patents/US6472319?utm_source=gb-gplus-sharePatente US6472319 - Method for manufacturing capacitor of semiconductor memory device by two-step thermal treatment
Method for manufacturing capacitor of semiconductor memory device by two ...
