Uniformity of plasma density and potential are increased by reducing plasma confinement through use of a non-uniform, graded magnetic field by asymmetric energization of electromagnets with a waveform including harmonics of a fundamental frequency. The magnetic field strength or intensity decreases in...http://www.google.es/patents/US5880034?utm_source=gb-gplus-sharePatente US5880034 - Reduction of semiconductor structure damage during reactive ion etching
Reduction of semiconductor structure damage during reactive ion etching
