Method of fabricating TFTs starts with forming a nickel film selectively on a bottom layer which is formed on a substrate. An amorphous silicon film is formed on the nickel film and heated to crystallize it. The crystallized film is irradiated with infrared light to anneal it. Thus, a crystalline silicon...http://www.google.es/patents/US5488000?utm_source=gb-gplus-sharePatente US5488000 - Method of fabricating a thin film transistor using a nickel silicide layer to promote crystallization of the amorphous silicon layer
Method of fabricating a thin film transistor using a nickel silicide layer ...
