A semiconductor processing method of forming a contact pedestal includes, a) providing a node location to which electrical connection is to be made; b) providing insulating dielectric material over the node location; c) etching a contact opening into the insulating dielectric material over the node location...http://www.google.es/patents/US6312984?utm_source=gb-gplus-sharePatente US6312984 - Semiconductor processing method of forming a contact pedestal of forming a storage node of a capacitor and integrated circuitry
Semiconductor processing method of forming a contact pedestal of forming a ...
