A process for forming a thin film by chemical vapor deposition which comprises repeating a substrate processing step on one or more substrates placed inside a reaction chamber by introducing a reaction gas inside the reaction chamber. The process includes a step of introducing a passivation gas or...http://www.google.es/patents/US5728629?utm_source=gb-gplus-sharePatente US5728629 - Process for preventing deposition on inner surfaces of CVD reactor
Process for preventing deposition on inner surfaces of CVD reactor
