A method is described for characterizing defects on a test surface of a semiconductor wafer using a confocal-microscope-based automatic defect characterization (ADC) system. The surface to be tested and a reference surface are scanned using a confocal microscope to obtain three-dimensional images of...http://www.google.es/patents/US6288782?utm_source=gb-gplus-sharePatente US6288782 - Method for characterizing defects on semiconductor wafers
Method for characterizing defects on semiconductor wafers
