The pressure and/or height of liquid in a liquid reservoir of an immersion lithography apparatus is obtained by a measurement device. The pressure and/or height can be used to determine the height and/or tilt of the substrate....http://www.google.es/patents/US7038760?utm_source=gb-gplus-sharePatente US7038760 - Lithographic apparatus and device manufacturing method
Lithographic apparatus and device manufacturing method
